The application of a known technique has been developed for preparing thin films of enriched UO2 to be used in the study of energy deposition efficiency by fission fragment escape from radioactive sources being irradiated. Films have been deposited on stainless-steel sheet by vacuum vapor deposition, using an electron gun to vaporize the UO2. The studies resulted in curves for rate of deposition and uniformity of thickness as well as an experimentally derived formula which relates deposition parameters to uniformity of thickness.