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Materials Science & Technology
The objectives of MSTD are: promote the advancement of materials science in Nuclear Science Technology; support the multidisciplines which constitute it; encourage research by providing a forum for the presentation, exchange, and documentation of relevant information; promote the interaction and communication among its members; and recognize and reward its members for significant contributions to the field of materials science in nuclear technology.
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ANS Student Conference 2025
April 3–5, 2025
Albuquerque, NM|The University of New Mexico
Standards Program
The Standards Committee is responsible for the development and maintenance of voluntary consensus standards that address the design, analysis, and operation of components, systems, and facilities related to the application of nuclear science and technology. Find out What’s New, check out the Standards Store, or Get Involved today!
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Candidates for leadership provide statements: ANS Board of Directors
With the annual ANS election right around the corner, American Nuclear Society members will be going to the polls to vote for a vice president/president-elect, treasurer, and members-at-large for the Board of Directors. In January, Nuclear News published statements from candidates for vice president/president-elect and treasurer. This month, we are featuring statements from each nominee for the Board of Directors.
Renato M. Baciarelli
Nuclear Technology | Volume 2 | Number 6 | December 1966 | Pages 471-476
Technical Paper and Note | doi.org/10.13182/NT66-A27539
Articles are hosted by Taylor and Francis Online.
The application of a known technique has been developed for preparing thin films of enriched UO2 to be used in the study of energy deposition efficiency by fission fragment escape from radioactive sources being irradiated. Films have been deposited on stainless-steel sheet by vacuum vapor deposition, using an electron gun to vaporize the UO2. The studies resulted in curves for rate of deposition and uniformity of thickness as well as an experimentally derived formula which relates deposition parameters to uniformity of thickness.