ANS is committed to advancing, fostering, and promoting the development and application of nuclear sciences and technologies to benefit society.
Explore the many uses for nuclear science and its impact on energy, the environment, healthcare, food, and more.
Explore membership for yourself or for your organization.
Conference Spotlight
Nuclear Energy Conference & Expo (NECX)
September 8–11, 2025
Atlanta, GA|Atlanta Marriott Marquis
Standards Program
The Standards Committee is responsible for the development and maintenance of voluntary consensus standards that address the design, analysis, and operation of components, systems, and facilities related to the application of nuclear science and technology. Find out What’s New, check out the Standards Store, or Get Involved today!
Latest Magazine Issues
Jul 2025
Jan 2025
Latest Journal Issues
Nuclear Science and Engineering
August 2025
Nuclear Technology
Fusion Science and Technology
July 2025
Latest News
Hash Hashemian: Visionary leadership
As Dr. Hashem M. “Hash” Hashemian prepares to step into his term as President of the American Nuclear Society, he is clear that he wants to make the most of this unique moment.
A groundswell in public approval of nuclear is finding a home in growing governmental support that is backed by a tailwind of technological innovation. “Now is a good time to be in nuclear,” Hashemian said, as he explained the criticality of this moment and what he hoped to accomplish as president.
Kenan Ünlü, Dietrich H. Vincent
Nuclear Science and Engineering | Volume 110 | Number 4 | April 1992 | Pages 386-393
Technical Paper | doi.org/10.13182/NSE92-A23912
Articles are hosted by Taylor and Francis Online.
Helium trapping and release are studied for the nickel-rich amorphous alloys Ni75.1 Cr14.0-P10.1C0.08, Ni63.5Zr36.5, and Ni87.7P12.3. Helium-3 is introduced into the samples by implantation at 150-keV energy. The depth distribution of the implanted helium is observed by neutron depth profiling employing the reaction 3He(n, p)3H. Two implantation doses are used: 1 × 1016 and 5 × 1016 3He/cm . Both implantation doses were chosen to be low enough to avoid blistering or flaking of the surface of the samples. The helium release behavior of the samples is studied by taking depth profiles after each annealing stage. At the same time, electron diffraction is used on parallel samples to observe the microstructure of the samples as a function of annealing. The annealing sequence for each material is broken off when electron diffraction indicated the existence of relatively large crystals in a sample. Only a small fraction of the implanted helium is released in most cases, and a clear correlation between helium release and recrystallization can be found in only one case.