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Division Spotlight
Nuclear Nonproliferation Policy
The mission of the Nuclear Nonproliferation Policy Division (NNPD) is to promote the peaceful use of nuclear technology while simultaneously preventing the diversion and misuse of nuclear material and technology through appropriate safeguards and security, and promotion of nuclear nonproliferation policies. To achieve this mission, the objectives of the NNPD are to: Promote policy that discourages the proliferation of nuclear technology and material to inappropriate entities. Provide information to ANS members, the technical community at large, opinion leaders, and decision makers to improve their understanding of nuclear nonproliferation issues. Become a recognized technical resource on nuclear nonproliferation, safeguards, and security issues. Serve as the integration and coordination body for nuclear nonproliferation activities for the ANS. Work cooperatively with other ANS divisions to achieve these objective nonproliferation policies.
Meeting Spotlight
Conference on Nuclear Training and Education: A Biennial International Forum (CONTE 2025)
February 3–6, 2025
Amelia Island, FL|Omni Amelia Island Resort
Standards Program
The Standards Committee is responsible for the development and maintenance of voluntary consensus standards that address the design, analysis, and operation of components, systems, and facilities related to the application of nuclear science and technology. Find out What’s New, check out the Standards Store, or Get Involved today!
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Fusion Science and Technology
Latest News
Christmas Night
Twas the night before Christmas when all through the houseNo electrons were flowing through even my mouse.
All devices were plugged in by the chimney with careWith the hope that St. Nikola Tesla would share.
Stephan A. Letts, Jared F. Hund, Justin Sin, Jonathan Monterrosa, Brian Motta, Rod Cahayag, Nicole Petta
Fusion Science and Technology | Volume 73 | Number 2 | March 2018 | Pages 265-272
Technical Paper | doi.org/10.1080/15361055.2017.1387457
Articles are hosted by Taylor and Francis Online.
Four different variations of doped, planar targets were fabricated using multilayer glow discharge polymerization for the foil thickness campaign at the Extended Performance Facility at the University of Rochester. The planar film targets consisted of from one to four layers of CH, CHGe, and CHSi. The composition of Ge and Si was controlled by the flow of dopant gas (either tetramethyl germane or tetramethyl silane) and measured with X-ray florescence. After laser cutting the 200 × 900 × 80-µm film targets out of the larger film, the targets were released from the substrate.
Coating nonuniformity when using an inductively coupled discharge device can be a challenge. We improved the uniformity by rotating the substrate. Film thickness was measured with a chromatic confocal sensor system. Thickness measurements were fit to a Gaussian function, which smoothed the thickness data set and allowed accurate interpolation of thickness measurements.
A challenge for freestanding, planar glow discharge polymer films is intrinsic stress in the coating. Prior to coating the final targets, the coating stress for various deposition parameters was measured. A series of runs with CH, CHGe, and CHSi were coated on thin silicon wafers. The wafers were characterized for bending before and after coating with a stylus profilometer to determine the coating stress using the Stony equation. In general, higher chamber operating pressures resulted in lower stress coatings.