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Fusion Science and Technology
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General Kenneth Nichols and the Manhattan Project
Nichols
The Oak Ridger has published the latest in a series of articles about General Kenneth D. Nichols, the Manhattan Project, and the 1954 Atomic Energy Act. The series has been produced by Nichols’ grandniece Barbara Rogers Scollin and Oak Ridge (Tenn.) city historian David Ray Smith. Gen. Nichols (1907–2000) was the district engineer for the Manhattan Engineer District during the Manhattan Project.
As Smith and Scollin explain, Nichols “had supervision of the research and development connected with, and the design, construction, and operation of, all plants required to produce plutonium-239 and uranium-235, including the construction of the towns of Oak Ridge, Tennessee, and Richland, Washington. The responsibility of his position was massive as he oversaw a workforce of both military and civilian personnel of approximately 125,000; his Oak Ridge office became the center of the wartime atomic energy’s activities.”
T. Saito, Y. Tatematsu, K. Kajiwara, H. Abe, M. Ishikawa, Y. Kiwamoto, Y. Imaizumi, K. Nishida, E. Yokoyama, M. Ichimura, K. Ishii, I. Katanuma, K. Yatsu
Fusion Science and Technology | Volume 39 | Number 1 | January 2001 | Pages 143-146
Topical Lectures | doi.org/10.13182/FST01-A11963427
Articles are hosted by Taylor and Francis Online.
This paper describes response of currents circulating in an end region of the GAMMA 10 tandem mirror to variation of an end plate resistance REP. By changing its value from less than 1 Ω to over 1 MΩ, are examined the variation of the plasma potentials and the current balance at the end plate during fundamental ECRH. Main results are as follows. First, for REP ≥ 3 kΩ, the end plate potential as measured from the vacuum vessel is nearly constant and for REP ≤ 0.5 kΩ, on the contrary, the current flowing through the resistance is nearly constant. Second, the plasma potentials other than the end plate weakly depends on REP. In particular, the plasma potential at the central cell hardly varies with REP. Third, with decreasing REP, a step-like increase in the net current flowing through the end plate is observed at REP ≈ Zeff. Ion currents are observed on ring electrodes installed in the mirror cell in which ECRH is applied. A part of the ion current is to be connected to the end plate current.