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General Kenneth Nichols and the Manhattan Project
Nichols
The Oak Ridger has published the latest in a series of articles about General Kenneth D. Nichols, the Manhattan Project, and the 1954 Atomic Energy Act. The series has been produced by Nichols’ grandniece Barbara Rogers Scollin and Oak Ridge (Tenn.) city historian David Ray Smith. Gen. Nichols (1907–2000) was the district engineer for the Manhattan Engineer District during the Manhattan Project.
As Smith and Scollin explain, Nichols “had supervision of the research and development connected with, and the design, construction, and operation of, all plants required to produce plutonium-239 and uranium-235, including the construction of the towns of Oak Ridge, Tennessee, and Richland, Washington. The responsibility of his position was massive as he oversaw a workforce of both military and civilian personnel of approximately 125,000; his Oak Ridge office became the center of the wartime atomic energy’s activities.”
R. McEachern, C. Alford
Fusion Science and Technology | Volume 35 | Number 2 | March 1999 | Pages 115-118
Technical Paper | doi.org/10.13182/FST99-A11963912
Articles are hosted by Taylor and Francis Online.
We are studying the feasibility of using boron doping to refine the grain structure of sputter-deposited Be for NIF ignition capsule ablators. The goal is to improve the surface finish and homogeneity of these coatings. Films deposited on flat silicon substrates display a pronounced change in structure at a concentration of ∼11 at.% B. At lower levels of B, grain sizes of about 200 nm are observed. AFM images show the roughness of these films to be about 20 nm rms. At higher levels of B, the grains size drops to below 50 nm and the roughness decreases to less than 2.5 nm rms. Films deposited on capsules do not show the same behavior. In particular, at 15 at.% B, the capsule coatings have nodular structure with an rms roughness of greater than 50 nm. When viewed in cross section, however, no structure is seen with either the flat films or the capsule coatings. We believe that differences in substrate temperature may be largely responsible for the observed behavior.