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The Young Members Group works to encourage and enable all young professional members to be actively involved in the efforts and endeavors of the Society at all levels (Professional Divisions, ANS Governance, Local Sections, etc.) as they transition from the role of a student to the role of a professional. It sponsors non-technical workshops and meetings that provide professional development and networking opportunities for young professionals, collaborates with other Divisions and Groups in developing technical and non-technical content for topical and national meetings, encourages its members to participate in the activities of the Groups and Divisions that are closely related to their professional interests as well as in their local sections, introduces young members to the rules and governance structure of the Society, and nominates young professionals for awards and leadership opportunities available to members.
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ANS Student Conference 2025
April 3–5, 2025
Albuquerque, NM|The University of New Mexico
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General Kenneth Nichols and the Manhattan Project
Nichols
The Oak Ridger has published the latest in a series of articles about General Kenneth D. Nichols, the Manhattan Project, and the 1954 Atomic Energy Act. The series has been produced by Nichols’ grandniece Barbara Rogers Scollin and Oak Ridge (Tenn.) city historian David Ray Smith. Gen. Nichols (1907–2000) was the district engineer for the Manhattan Engineer District during the Manhattan Project.
As Smith and Scollin explain, Nichols “had supervision of the research and development connected with, and the design, construction, and operation of, all plants required to produce plutonium-239 and uranium-235, including the construction of the towns of Oak Ridge, Tennessee, and Richland, Washington. The responsibility of his position was massive as he oversaw a workforce of both military and civilian personnel of approximately 125,000; his Oak Ridge office became the center of the wartime atomic energy’s activities.”
A. R. Krauss, D. M. Gruen, J. N. Brooks, M. H. Mendelsohn, R. F. Mattas, A. B. DeWald
Fusion Science and Technology | Volume 8 | Number 1 | July 1985 | Pages 1269-1274
Impurity Control and Vacuum Technology | Proceedings of the Sixth Topical Meeting on the Technology of Fusion Energy (San Francisco, California, March 3-7, 1985) | doi.org/10.13182/FST85-A39942
Articles are hosted by Taylor and Francis Online.
Dilute binary alloys have been discussed previously as a means of producing self-sustaining coatings for fusion applications. The anticipated advantages of such coatings are described in a companion paper.11 Issues addressed in this paper concern experimental observation of the formation of a low-Z coating by solute segregation in a Cu-Li alloy, maintenance of the coating in a sputtering environment, and a comparison of the calculated net erosion for W, Mo, and Cu-Li when used as either the divertor plate or the bottom limiter for INTOR. Auger electron spectroscopy has been used to monitor the surface composition of an alloy consisting of 3.0 at.% Li in Cu while sputtering with 1–3 keV Ar+ or He+ at a flux of 1012 – 1014 cm−2 sec−1 (corresponding to a gross erosion rate of several mm/yr) at temperatures up to 430°C. It is found that the alloy is capable of reproducibly maintaining a complete lithium overlayer. The time-dependent thickness of the overlayer depends strongly on the mass and energy spectrum of the incident particle flux. It has been experimentally demonstrated that a significant fraction of the sputtered lithium is in the form Li+ and is returned to the surface by an electric field such as the sheath potential at the limiter, or a tangential magnetic field such as the toroidal field at the first wall; consequently, the overlayer lifetime is essentially unlimited. The TRIM computer code has been used to calculate the sputtering yield for pure metals and the partial sputtering yields of binary alloy components for various assumed solute concentration profiles. It is found that even with very low-Z coatings, the majority of the sputtered atoms originate in the uppermost atomic layer and that the partial sputtering yield of an alloy component is significantly reduced if that component is excluded from the uppermost atomic layer. It is predicted that the self-sputtering behavior of Cu-Li when used as a limiter or divertor plate will compare very favorably with that of tungsten. Calculations using the REDEP code bear out this expectation. At low plasma edge temperatures (< 50 eV), the net erosion (erosion minus redeposition) due to D,T,He and self-sputtering is nearly zero, while the gross erosion is less than that of Mo, For edge temperatures > 50 eV, W, and Mo are unusable due to self-sputtering. It is calculated that in the intermediate edge temperature regime (50–200 eV), a limiter made of copper with a lithium coating 1.5 monolayers thick would show net growth or erosion of < 3 mm per year. Consequently, Cu-Li alloy may be the only material suitable for use with intermediate plasma edge temperatures.