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Colin Judge: Testing structural materials in Idaho’s newest hot cell facility
Idaho National Laboratory’s newest facility—the Sample Preparation Laboratory (SPL)—sits across the road from the Hot Fuel Examination Facility (HFEF), which started operating in 1975. SPL will host the first new hot cells at INL’s Materials and Fuels Complex (MFC) in 50 years, giving INL researchers and partners new flexibility to test the structural properties of irradiated materials fresh from the Advanced Test Reactor (ATR) or from a partner’s facility.
Materials meant to withstand extreme conditions in fission or fusion power plants must be tested under similar conditions and pushed past their breaking points so performance and limitations can be understood and improved. Once irradiated, materials samples can be cut down to size in SPL and packaged for testing in other facilities at INL or other national laboratories, commercial labs, or universities. But they can also be subjected to extreme thermal or corrosive conditions and mechanical testing right in SPL, explains Colin Judge, who, as INL’s division director for nuclear materials performance, oversees SPL and other facilities at the MFC.
SPL won’t go “hot” until January 2026, but Judge spoke with NN staff writer Susan Gallier about its capabilities as his team was moving instruments into the new facility.
Stefan Costea et al.
Fusion Science and Technology | Volume 48 | Number 1 | July-August 2005 | Pages 712-715
Technical Paper | Tritium Science and Technology - Properties, Reactions, and Applications | doi.org/10.13182/FST05-A1023
Articles are hosted by Taylor and Francis Online.
Hydrogen is known to strongly affect the physical properties of amorphous semiconductors. Indeed hydrogen is introduced during the growth of amorphous silicon films, used in active matrix displays and solar cells, to passivate silicon dangling bonds and to relax the lattice thereby reducing the density of states in the energy gap by several orders of magnitude and giving rise to device grade material. Ideally, hydrogenated amorphous silicon (a-Si:H) is a continuous covalently bonded random network of silicon-silicon and silicon-hydrogen atoms, with the predominant nearest neighbour environment similar to that of crystalline silicon. a-Si:H typically contains about 10 atomic percent hydrogen.Tritium can readily substitute for hydrogen in a-Si:H without altering the physicochemical properties of the material. Tritium decay leads to a change in the local bond structure of the material as helium detaches from bonds leaving behind dangling bonds. The decay rate of tritium and therefore the rate of dangling bond formation is determined by the half-life of tritium. Hence, tritium provides a unique avenue to dynamically study the effect of dangling bonds on the density of states in the energy gap and therefore on the optoelectronic properties of a-Si:H. Tritiated hydrogenated amorphous silicon (a-Si:H:T) was deposited using mixtures of tritium and silane gases in a dc saddle-field glow-discharge deposition system. The amount of tritium in the films was controlled by adjusting the relative flow of tritium and silane gases into the deposition chamber.Photoluminescence, isothermal capacitive transient spectroscopy and constant photocurrent spectroscopy were used to measure defect concentration as a function of time in the films. The defect concentration was found to increase between 1 and 2 orders of magnitude, in about 300 hours. Thermal annealing decreased the defect concentration. It was found that tritium permits a study of the change in the density of defect states due to dangling bond formation in a-Si:H without the uncertainties introduced by the use of multiple samples.